| Tungsten (W) Series Sputtering Target/Cathode | |||
| Item | Material | Purities | Application |
| W | Tungsten | 4N5, 5N, 5N5 | Electronics, Semiconductor |
| W | Tungsten | 3N | Glass |
| WTi (90/10, 80/20) | Tungsten/Titanium |
4N5, 5N, 5N5 |
Electronics, Semiconductor |
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WSi (90/10, 80/20) |
Tungsten/Silicon |
4N5, 5N, 5N5 |
Electronics, Semiconductor |
| Other W | Tungsten/Tungsten alloys | * | Others |
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ASTM B760-2007(2013) |
Standard Specification for Tungsten Plate, Sheet, and Foil |
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ASTM B777-2015 |
Standard Specification for Tungsten Base, High-Density Metal |
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YS/T 900-2013 |
Methods for chemical analysis of the high purity tungsten.Determination of trace impurity element content. Inductively coupled plasma mass spectrometry |
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YS/T 901-2013 |
Methods for chemical analysis of high purity tungsten.Determination of trace impurity element content. Glow discharge mass spectrometry |
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YS/T 1025-2015 |
High-purity tungsten and tungsten alloy sputtering target used in electronic film |
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DS/ISO 2768-1-1993 |
Tolerances for linear and angular dimensions without individual tolerance indications |
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DS/ISO 2768-2-1993 |
Geometrical tolerances for features without individual tolerance indications |
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| Tungsten Sputtering target | Forming (Smelting, Powder metallurgy) |
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| Inspection | Machining |
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| Analysis | Microstructure |
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| Surface Quality | Surface Quality |
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| Sputtering target and Cathode |
Sputtering target and Cathode |
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Sputtering target and Cathode |
Sputtering target and Cathode |
Contact: Sales Dept.
Phone: (86) 186 0101 9114 (ER only)
Tel: (86) 10-52868200/01/02/03
Email: sales@sinomaterial.com
Add: 5-301, Lincui West Road, Chaoyang, Beijing China
Sputtering target
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