Sputtering Target

  • Titanium sputtering target
Titanium sputtering target

Titanium sputtering target

  • Purity: 99.4-99.999% available
  • ASTM, GB, ISO
  • Rectangular, Wafer, Tube, etc.
  • Customization supported
  • Product description: 99.9-99.999% Titanium series sputtering targets and cathode.
  • INQUIRY


Titanium (Ti) Series Sputtering Target/Cathode
Item Material Purities Application
Ti Titanium 3N, 4N, 4N5, 5N Electronics, semiconductor
Ti
Titanium
2N7, 3N5, 4N5 Display
Ti
Titanium
2N4 Glass
Ti
Titanium
* Magnetic
Ti
Titanium
3N5, 3N Display
Ti
* Others
  • Purity: 99.9 - 99.9995%
  • Standards: ASTM, GB, GB/T, ISO, YS/T
  • Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored.
  • Backing plate and supporter: To provide specifications of aluminum target supporter, mammography supporter, copper target supporter, Titanium target supporter.
  • Services
  • Target metallization services
  • Target bonding services.
  • MSDS, RoHS (upon request)

ASTM B265-2015 Standard Specification for Titanium and Titanium Alloy Strip, Sheet, and Plate
ASTM B348-2013
Standard Specification for Titanium and Titanium Alloy Bars and Billets
ASTM B367-2013(2017)
Standard Specification for Titanium and Titanium Alloy Castings
ASTM B600-2011(2017)
Standard Guide for Descaling and Cleaning Titanium and Titanium Alloy Surfaces
ASTM B977-2013
Standard Specification for Titanium and Titanium Ingots
ASTM F1709-1997(2016)
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
YS/T 891-2013

Methods for chemical analysis of high purity titanium.Determination of trace impurity element content.

Glow discharge mass spectrometry

YS/T 892-2013
Methods for chemical analysis of high purity titanium.Determination of trace impurity element content.Inductively coupled plasma mass spectrometry
YS/T 893-2013
High-purity sputtering titanium target used in electronic film
GB/T 3620.1-2016
Designation and composition of titanium and titanium alloys
GB/T 3620.2-2007
Titanium and titanium alloys permissible variations of chemical composition for wrought product analysis
GB/T 3621-2007
Titanium and titanium alloy plate and sheet
DS/ISO 2768-1-1993
Tolerances for linear and angular dimensions without individual tolerance indications
DS/ISO 2768-2-1993
Geometrical tolerances for features without individual tolerance indications

Titanium sputtering target
smelting
Titanium Sputtering target Forming (Smelting, Powder metallurgy)
Inspection Machining
Inspection Machining
Analysis Microstructure
Analysis Microstructure
Surface Surface
Surface Quality Surface Quality
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode
Sputtering target and Cathode

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Phone: (86) 186 0101 9114 (ER only)

Tel: (86) 10-52868200/01/02/03

Email: sales@sinomaterial.com

Add: 5-301, Lincui West Road, Chaoyang, Beijing China