Sputtering Target

Aluminium sputtering target

Purity: 99.9-99.99% available
ASTM B391-2018
Rectangular, Wafer, Tube, etc.
Customization supported
Product description: Aluminium series sputtering targets and cathode in accordance with ASTM, including various pure Aluminium and Aluminium alloys targets
INQUIRY

Aluminium (Al) Series Sputtering Target/Cathode
Item	Material	Purities	Application
Al	Aluminium	99.9-99.999%	Electonic, Simiconductor, Display, Optical
AlTi	Aluminium Titanium	99.2-99.99%	Hardware, tools
AlCr	Aluminium Chromium	99.5-99.99%	Hardware, tools
AlNi	Aluminium Nickel	99.9-99.99%
AlZn	Aluminium Zinc	99.9-99.99%	Glass, Optical, Photoltaics
AlSi	Aluminium Silicon	99.9-99.999%	Electonic, Simiconductor
AlCu	Aluminium Copper	99.99-99.999%	Electonic, Simiconductor
AlSiCu	Aluminium Silicon Copper	99.99-99.999%	Electonic, Simiconductor
Other Al	Aluminium other alloys	99.9-99.95%	Others
Purity: 99.9 - 99.999% Standards: ASTM GB/T ISO Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored. Backing plate and supporter: To provide specifications of aluminum supporter, Molybdenum supporter, copper supporter, Titanium supporter. Services Target metallization services Target bonding services.

High-purity sputtering aluminium and aluminium alloy target used in electronic film

Chemical analysis of high purity aluminium.Determination of trace impurities

.Inductively coupled plasma mass spectrometry

Chemical analysis of high purity aluminium.Determination of trace impurities.

Glow discharge mass spectrometry


Aluminium Sputtering target	Forming (Smelting, Powder metallurgy)

Inspection	Machining

Analysis	Microstructure

Surface Quality	Surface Quality

Sputtering target and Cathode	Sputtering target and Cathode

Sputtering target and Cathode	Sputtering target and Cathode