Sputtering Target

  • Chromium sputtering target
Chromium sputtering target

Chromium sputtering target

  • Purity: 99.5-99.99% available
  • High density
  • Rectangular, Wafer, Tube, etc.
  • Customization supported
  • Product description: Chromium series sputtering targets and cathode in accordance with ASTM, including various pure Chromium and Chromium alloys targets
  • INQUIRY


Chromium (Cr) Series Sputtering Target/Cathode
Item Material Purities Application
Cr Chromium 99.5-99.99% Decoration, tools, glass
CrSi
Chromium Silicon 99.5-99.99% Tools, glass, Display
CrAl Chromium Aluminum 99.5-99.99%
Decoration, tools, glass
Other Cr Chromium / Chromium alloys 99.5-99.99%
Others
  • Purity: 99.5 - 99.99%
  • Standards: ASTM   GB/T  ISO
  • Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored.
  • Backing plate and supporter: To provide specifications of aluminum supporter, Molybdenum supporter, copper supporter, Titanium supporter.
  • Services
  • Target metallization services
  • Target bonding services.

ASTM A481-2005(2015)
Standard Specification for Chromium Metal
QB 162-15 High purity Chromium

Chromium sputtering target smelting
Niobium Sputtering target Forming (Smelting, Powder metallurgy)
Inspection Machining
Inspection Machining
Analysis Microstructure
Analysis Microstructure
Surface Surface
Surface Quality Surface Quality
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode
Sputtering target and Cathode

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Contact: Sales Dept.

Phone: (86) 186 0101 9114 (ER only)

Tel: (86) 10-52868200/01/02/03

Email: sales@sinomaterial.com

Add: 5-301, Lincui West Road, Chaoyang, Beijing China