Nickel (Ni) Series Sputtering Target/Cathode | |||
Item | Material | Purities | Application |
Ni | Nickel | 99.9-99.99% | Electronics, Smiconductor, Display, Magnetic |
NiAl | Nickel Aluminium | 99.9-99.99% |
Electronics, Smiconductor |
NiCr | Nickel Chromium | 99.9-99.99% | Glass |
NiV | Nickel Vanadium | 99.9-99.99% | Electronics, Smiconductor, Glass |
NiW | Nickel Tungsten |
99.9-99.99% |
Magnetic |
Other Ni | Nickel/ Nickel alloys | 99.9-99.99% |
Other |
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GB/T 5235-2007 |
Wrought nickel and nickel alloys Chemical composition and forms of wrought products |
GB/T 26016-2010 |
High purity nickel
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GB/T 2054-2013 |
Nickel and nickel alloy plate and sheet |
GB/T 2882-2013 |
Nickel and nickel alloys tube |
DIN 17740-2002 |
Wrought nickel - Chemical composition |
DIN 17741-2002 |
Wrought nickel alloys, low alloyed - Chemical composition |
DIN 17742-2002 |
Wrought nickel alloys with chromium - Chemical composition |
DIN 17743-2002 |
Wrought nickel alloys with copper - Chemical composition |
DIN 17750-2002 |
Plates, strips and sheets of wrought nickel and nickel alloys - Properties |
DIN 17751-2002 |
Tubes of wrought nickel and nickel alloys - Properties |
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Nickel Sputtering target | Forming (Smelting, Powder metallurgy) |
Inspection | Machining |
Analysis | Microstructure |
Surface Quality | Surface Quality |
Sputtering target and Cathode |
Sputtering target and Cathode |
Sputtering target and Cathode |
Sputtering target and Cathode |
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Tel: (86) 10-52868200/01/02/03
Email: sales@sinomaterial.com
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