Sputtering Target

  • Nickel sputtering target
Nickel sputtering target

Nickel sputtering target

  • Purity: 99.9-99.999% available
  • ASTM B391-2018
  • Rectangular, Wafer, Tube, etc.
  • Customization supported
  • Product description: Nickel series sputtering targets including various pure Nickel and Nickel Vanadium targets
  • INQUIRY


Nickel (Ni) Series Sputtering Target/Cathode
Item Material Purities Application
Ni Nickel 99.9-99.99% Electronics, Smiconductor, Display, Magnetic
NiAl Nickel Aluminium 99.9-99.99% Electronics, Smiconductor
NiCr Nickel Chromium 99.9-99.99% Glass
NiV Nickel Vanadium 99.9-99.99% Electronics, Smiconductor, Glass
NiW Nickel Tungsten 99.9-99.99%
Magnetic
Other Ni Nickel/ Nickel alloys 99.9-99.99% Other
  • Purity: 99.9 - 99.99%
  • Standards: ASTM   GB/T  ISO
  • Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored.
  • Backing plate and supporter: To provide specifications of aluminum supporter, Molybdenum supporter, copper supporter, Titanium supporter.
  • Services
  • Target metallization services
  • Target bonding services.

GB/T 5235-2007
Wrought nickel and nickel alloys Chemical composition and forms of wrought products
GB/T 26016-2010

High purity nickel

GB/T 2054-2013
Nickel and nickel alloy plate and sheet
GB/T 2882-2013
Nickel and nickel alloys tube
DIN 17740-2002
Wrought nickel - Chemical composition
DIN 17741-2002
Wrought nickel alloys, low alloyed - Chemical composition
DIN 17742-2002
Wrought nickel alloys with chromium - Chemical composition
DIN 17743-2002
Wrought nickel alloys with copper - Chemical composition
DIN 17750-2002
Plates, strips and sheets of wrought nickel and nickel alloys - Properties
DIN 17751-2002
Tubes of wrought nickel and nickel alloys - Properties

Nickel sputtering target
smelting
Nickel Sputtering target Forming (Smelting, Powder metallurgy)
Inspection Machining
Inspection Machining
Analysis Microstructure
Analysis Microstructure
Surface Surface
Surface Quality Surface Quality
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode Sputtering target and Cathode
Sputtering target and Cathode
Sputtering target and Cathode

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